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Plarion are experts in the production of accurate thin films, with excellent uniformity and repeatability, from microns to nanometres in thickness, in a wide range of materials.
Sputter Coating
Plarion has a 9 chamber DC/RF Sprinter coater, for vacuum deposition of thin films, by depositing layers atom-by-atom or molecule-by-molecule at sub-atmospheric pressure.
Up to 11 different materials may be deposited in 30 layers without breaking vacuum, making specialised stack designs possible.
Polycarbonate, glass and silicon substrates can be coated, up to 130mm diameter (5” wafers) and 1.5mm thick.
Thicknesses down to 1 nanometre may be achieved with ± 0.1 nm repeatability.
Multi-material co-sputtering
Multi-material co-sputtering enables up to 4 materials to be combined into a single layer - for making alloys and composites in situ.
Reactive sputtering mixes a gas into the plasma, enabling oxides and nitrides of target materials to be created.
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